Invention Grant
- Patent Title: ICP antenna and substrate processing device including the same
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Application No.: US16480355Application Date: 2017-12-05
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Publication No.: US10892139B2Publication Date: 2021-01-12
- Inventor: Yoon Seok Choi
- Applicant: EUGENE TECHNOLOGY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: EUGENE TECHNOLOGY CO., LTD.
- Current Assignee: EUGENE TECHNOLOGY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2017-0018738 20170210
- International Application: PCT/KR2017/014150 WO 20171205
- International Announcement: WO2018/147537 WO 20180816
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H03H7/38
Abstract:
Provided is an ICP antenna used in a plasma processing device. The ICP antenna includes an antenna coil having one end connected to an RF power source through an impedance matching circuit and the other end that is grounded; and a variable capacitor connected in parallel to a portion of the antenna coil.
Public/Granted literature
- US20190385814A1 ICP ANTENNA AND SUBSTRATE PROCESSING DEVICE INCLUDING THE SAME Public/Granted day:2019-12-19
Information query
