Invention Grant
- Patent Title: Substrate cleaning roll, substrate cleaning apparatus, and substrate cleaning method
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Application No.: US15522596Application Date: 2015-10-20
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Publication No.: US10892173B2Publication Date: 2021-01-12
- Inventor: Tomoatsu Ishibashi
- Applicant: Ebara Corporation
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2014-223728 20141031
- International Application: PCT/JP2015/005280 WO 20151020
- International Announcement: WO2016/067563 WO 20160506
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B1/00 ; B08B1/04 ; B08B3/08 ; H01L21/02

Abstract:
A substrate cleaning roll that has a cylindrical shape and scrubs a surface of a substrate by rotating about a rotational axis in a longitudinal direction in contact with the substrate, the longitudinal direction being parallel to the surface of the substrate, the substrate cleaning roll including a bevel cleaner at least at one end of the substrate cleaning roll in the longitudinal direction, the bevel cleaner including a sloping surface to be in contact with an outermost edge of a bevel portion at a rim of the substrate when the substrate cleaning roll comes into contact with the substrate and cleans the surface of the substrate.
Public/Granted literature
- US20170316959A1 SUBSTRATE CLEANING ROLL, SUBSTRATE CLEANING APPARATUS, AND SUBSTRATE CLEANING METHOD Public/Granted day:2017-11-02
Information query
IPC分类: