Invention Grant
- Patent Title: Semiconductor fabrication apparatus and semiconductor fabrication method
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Application No.: US16126009Application Date: 2018-09-10
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Publication No.: US10892240B2Publication Date: 2021-01-12
- Inventor: Keiichi Niwa
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2018-053261 20180320
- Main IPC: B23K1/00
- IPC: B23K1/00 ; H01L23/00 ; B23K1/20 ; B23K101/40 ; B23K3/08

Abstract:
A semiconductor fabrication apparatus has a transfer plate having a plurality of transfer pins to transfer a flux onto a plurality of lands on a semiconductor substrate, a holder movable with the transfer plate, to hold the transfer plate, a positioning mechanism to perform positioning of the holder so that the plurality of lands and the respective transfer pins contact each other; and a pitch adjuster to adjust a pitch of at least part of the plurality of transfer pins.
Public/Granted literature
- US20190295976A1 SEMICONDUCTOR FABRICATION APPARATUS AND SEMICONDUCTOR FABRICATION METHOD Public/Granted day:2019-09-26
Information query
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