Invention Grant
- Patent Title: Semiconductor device having junctionless vertical gate transistor and method of manufacturing the same
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Application No.: US16398118Application Date: 2019-04-29
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Publication No.: US10892262B2Publication Date: 2021-01-12
- Inventor: Jung-Min Moon , Tae-Kyun Kim , Seok-Hee Lee
- Applicant: SK hynix Inc. , Korea Advanced Institute of Science and Technology
- Applicant Address: KR Icheon; KR Daejeon
- Assignee: SK hynix Inc.,Korea Advanced Institute of Science and Technology
- Current Assignee: SK hynix Inc.,Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Icheon; KR Daejeon
- Priority: KR10-2012-0024991 20120312
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/78 ; H01L29/66 ; H01L29/10 ; H01L29/423

Abstract:
A junctionless vertical gate transistor includes an active pillar vertically protruding from a substrate and including a first impurity region, a second impurity region and a third impurity region sequentially formed over the first impurity region; gate electrodes coupled to sidewalls of the second impurity region; and bit lines arranged in a direction of intersecting with the gate electrodes and each contacting the first impurity region. The first to the third impurity regions include impurities of the same polarity.
Public/Granted literature
- US20190252387A1 SEMICONDUCTOR DEVICE HAVING JUNCTIONLESS VERTICAL GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-08-15
Information query
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