Invention Grant
- Patent Title: Variable resistance memory devices and methods of manufacturing variable resistance memory devices
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Application No.: US16459637Application Date: 2019-07-02
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Publication No.: US10892410B2Publication Date: 2021-01-12
- Inventor: Jeonghee Park , Jiho Park , Changyup Park , Dongho Ahn
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A,
- Priority: KR10-2018-0101800 20180829
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A variable resistance memory device may include insulating layers stacked on a substrate, a first conductive line penetrating the insulating layers, switching patterns between the insulating layers, a phase change pattern between the first conductive line and each of the switching patterns, and a capping pattern disposed between the phase change pattern and the first conductive line and disposed in a region surrounded by the phase change pattern.
Public/Granted literature
- US20200075850A1 VARIABLE RESISTANCE MEMORY DEVICES AND METHODS OF MANUFACTURING VARIABLE RESISTANCE MEMORY DEVICES Public/Granted day:2020-03-05
Information query
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