Invention Grant
- Patent Title: Profile adjustment method, and profile adjustment device
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Application No.: US15996582Application Date: 2018-06-04
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Publication No.: US10893170B2Publication Date: 2021-01-12
- Inventor: Kenji Fukasawa , Mitsuhiro Yamashita
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2017-111410 20170606
- Main IPC: H04N1/60
- IPC: H04N1/60

Abstract:
A profile adjustment method is a method of causing a computer to adjust a profile to be used to convert first coordinate values of a first color space into second coordinate values of a second color space. The profile adjustment method includes: accepting one of two or more kinds of profiles as an adjustment target profile among an input profile defining a correspondent relation between the first coordinate values and third coordinate values of a profile connection space, an output profile defining a correspondent relation between the third coordinate values and the second coordinate values, and a link profile defining a correspondent relation between the first coordinate values and the second coordinate values; accepting an adjustment target at coordinates at which an adjustment target color is expressed; and adjusting the adjustment target profile based on the accepted adjustment target.
Public/Granted literature
- US20180352114A1 PROFILE ADJUSTMENT METHOD, AND PROFILE ADJUSTMENT DEVICE Public/Granted day:2018-12-06
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