Invention Grant
- Patent Title: Method for manufacturing multilayer substrate
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Application No.: US16158334Application Date: 2018-10-12
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Publication No.: US10893618B2Publication Date: 2021-01-12
- Inventor: Kuniaki Yosui , Naoki Gouchi , Shingo Ito
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo
- Agency: Keating & Bennett, LLP
- Priority: JP2016-229706 20161128
- Main IPC: H05K3/46
- IPC: H05K3/46 ; H05K1/02 ; H05K1/16 ; H01F41/04 ; H01F17/00 ; H01F27/29 ; H05K1/18

Abstract:
A multilayer substrate includes a lamination body including a first resin substrate, a second resin substrate, and a bonding layer that are hot-pressed. A first conductor pattern including a surface defined by a plated film is disposed on a first surface of the first resin substrate. A second conductor pattern including a surface defined by a plated film is disposed on a second surface of the first resin substrate. A third conductor pattern including a surface defined by a plated film is disposed on a third surface of the second resin substrate. A fourth conductor pattern including a surface defined by a plated film is disposed on a fourth surface of the second resin substrate. The first conductor pattern is located closer to one outermost layer than the second conductor pattern is. The second conductor pattern is thinner than the first conductor pattern.
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