Invention Grant
- Patent Title: Vapor deposition mask with metal plate
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Application No.: US16506107Application Date: 2019-07-09
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Publication No.: US10894267B2Publication Date: 2021-01-19
- Inventor: Yoshinori Hirobe , Yutaka Matsumoto , Masato Ushikusa , Toshihiko Takeda , Hiroyuki Nishimura , Katsunari Obata , Takashi Takekoshi
- Applicant: Dai Nippon Printing Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2012-004484 20120112
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B05B12/20 ; B05C21/00 ; H01L51/00 ; B32B37/18 ; B32B38/00 ; H01L51/56 ; H01L51/50

Abstract:
A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.
Public/Granted literature
- US20190329277A1 VAPOR DEPOSITION MASK WITH METAL PLATE Public/Granted day:2019-10-31
Information query
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