Invention Grant
- Patent Title: Pellicle manufacturing method and method for manufacturing photomask with pellicle
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Application No.: US15794420Application Date: 2017-10-26
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Publication No.: US10895805B2Publication Date: 2021-01-19
- Inventor: Kazuo Kohmura , Daiki Taneichi , Yosuke Ono , Hisako Ishikawa , Tsuneaki Biyajima , Yasuyuki Sato , Toshiaki Hirota
- Applicant: MITSUI CHEMICALS, INC. , TAZMO CO., LTD.
- Applicant Address: JP Tokyo; JP Okayama
- Assignee: MITSUI CHEMICALS, INC.,TAZMO CO., LTD.
- Current Assignee: MITSUI CHEMICALS, INC.,TAZMO CO., LTD.
- Current Assignee Address: JP Tokyo; JP Okayama
- Agency: Buchanan, Ingersoll & Rooney PC
- Priority: JP2015-090780 20150427
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/60 ; G03F1/64 ; C09J7/38 ; G03F1/80

Abstract:
A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
Public/Granted literature
- US20180046071A1 PELLICLE MANUFACTURING METHOD AND METHOD FOR MANUFACTURING PHOTOMASK WITH PELLICLE Public/Granted day:2018-02-15
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