Invention Grant
- Patent Title: Processing system
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Application No.: US15938453Application Date: 2018-03-28
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Publication No.: US10896835B2Publication Date: 2021-01-19
- Inventor: Atsushi Kawabe , Keisuke Kondoh
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2017-070987 20170331
- Main IPC: H01L21/677
- IPC: H01L21/677 ; B65G47/90 ; H01L21/67

Abstract:
A system includes a transfer device for transferring workpieces in an atmospheric atmosphere, a transfer unit for transferring the workpieces in a vacuum atmosphere, and a vacuum processing unit including vacuum process chambers connected to the transfer unit and for performing a process on the workpieces in each process chamber. The vacuum processing unit simultaneously performs the process on the workpieces in each process chamber. The process chambers are arranged along a first direction. The transfer unit includes first and second common transfer devices installed along the first direction to transfer the workpieces along the first direction. The first common transfer device is connected to each process chamber at a first side in a second direction perpendicular to the first direction, the second common transfer device is connected to each process chamber at a second side in the second direction.
Public/Granted literature
- US20180286729A1 PROCESSING SYSTEM Public/Granted day:2018-10-04
Information query
IPC分类: