Invention Grant
- Patent Title: Electrostatic chuck
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Application No.: US16034600Application Date: 2018-07-13
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Publication No.: US10896836B2Publication Date: 2021-01-19
- Inventor: Kenta Chito , Hidekazu Iida , Tomohiro Yamada , Yoshiteru Nishida , Hiroyuki Takahashi , Ryoko Fujiya , Susumu Yokoo
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2017-137501 20170714
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; H01L21/3065 ; H01L21/687

Abstract:
An electrostatic chuck is provided and has a holding surface for holding a wafer with a tape attached to one side of the wafer where the tape is in contact with the holding surface. The electrostatic chuck includes a disk-shaped member having a plurality of fine holes communicating with a vacuum source, where the fine holes are exposed to the holding surface. The disk-shaped member also includes a plurality of asperities formed on the holding surface and connected to the fine holes, and an electrode embedded in the disk-shaped member. The vacuum source is operated to produce a vacuum on the holding surface through the fine holes and thereby hold the wafer through the tape on the holding surface under suction, where the asperities formed on the holding surface function as a suction passage communicating with the fine holes.
Public/Granted literature
- US20190019712A1 ELECTROSTATIC CHUCK Public/Granted day:2019-01-17
Information query
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