Invention Grant
- Patent Title: Processing apparatus and processing method
-
Application No.: US16039569Application Date: 2018-07-19
-
Publication No.: US10896858B2Publication Date: 2021-01-19
- Inventor: Keiichi Tanaka
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2017-147996 20170731
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/311 ; H01L21/67 ; H01L21/02 ; H01L37/02 ; C23C16/00 ; H01L21/677

Abstract:
Disclosed is a processing method for performing a processing corresponding to a processing gas in a plurality of processing containers which are connected to a gas supply source, and at least some of which have different lengths of pipes to the gas supply source. The processing method includes simultaneously supplying the processing gas from the gas supply source to the plurality of processing containers, and individually supplying the processing gas from the gas supply source to the plurality of processing containers or to some of the plurality of processing containers.
Public/Granted literature
- US20190035698A1 PROCESSING APPARATUS AND PROCESSING METHOD Public/Granted day:2019-01-31
Information query
IPC分类: