Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16228807Application Date: 2018-12-21
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Publication No.: US10896961B2Publication Date: 2021-01-19
- Inventor: Daisuke Ozaki , Ryouichi Kawano
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2017-011704 20170125
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/78 ; H01L29/06 ; H01L29/739 ; H01L29/861

Abstract:
A semiconductor device is provided comprising an active portion and a terminating structure. The semiconductor device is provided comprising the active portion provided in the semiconductor substrate and a terminating structure provided at a termination of the front surface side of the semiconductor substrate and that mitigates an electric field of the termination. In the electric field distribution of the front surface side of the terminating structure, during rated voltage application, an electric field at the end portion of the active portion side may be smaller than a maximum value of an electric field distribution of the front surface side. In addition, the electric field distribution of the terminating structure may have a maximum peak of the electric field on the edge side opposite to the active portion with respect to a center of the terminating structure.
Public/Granted literature
- US20190131412A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-05-02
Information query
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