Invention Grant
- Patent Title: Optical metrology system using infrared wavelengths
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Application No.: US16352716Application Date: 2019-03-13
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Publication No.: US10901241B1Publication Date: 2021-01-26
- Inventor: George Andrew Antonelli , Troy Daniel Ribaudo
- Applicant: ONTO INNOVATION INC.
- Applicant Address: US MA Wilmington
- Assignee: ONTO INNOVATION INC.
- Current Assignee: ONTO INNOVATION INC.
- Current Assignee Address: US MA Wilmington
- Agency: Paradice and Li LLP
- Main IPC: G01B11/06
- IPC: G01B11/06 ; G02F1/01 ; H01S5/34

Abstract:
An optical metrology device produces beams of light with varying wavelengths in a spectral range for measurement of a sample that is at least partially transparent to the spectral range. The light is obliquely incident on the sample, where a portion of the light is reflected off the top surface and a portion is transmitted through the sample and is reflected off the bottom surface. The incident light and/or reflected light is polarized and a phase modulator, such as a photoelastic modulator or electrooptic modulator, is adjusted based on the wavelengths in each beam of light to produce a same retardation of polarization for each beam of light. The reflected light that is received by a detector does not include light reflected from the bottom surface of the sample. A characteristic of a buried structure below the top surface of the sample is determined using the detected reflected light.
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