Invention Grant
- Patent Title: Imprint method, imprint apparatus, and article manufacturing method using the same
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Application No.: US14376221Application Date: 2013-03-07
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Publication No.: US10901324B2Publication Date: 2021-01-26
- Inventor: Nozomu Hayashi
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-053993 20120312,JP2013-041424 20130304
- International Application: PCT/JP2013/001435 WO 20130307
- International Announcement: WO2013/136730 WO 20130919
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L23/544 ; H01L21/66 ; B29C59/02 ; B29C59/00 ; G03F9/00 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; B29L31/34 ; B29L9/00 ; B29K101/00
Abstract:
A imprint method includes contacting the pattern formed on the mold M with the imprint material R supplied to a shot on the substrate W; and detecting a plurality of alignment marks AMM and AMW in the contacting while changing a position of a detector for detecting the plurality of alignment marks AMM and AMW formed on the shot on the substrate W in accordance with a progress of filling of the imprint material R into the pattern formed on the mold M.
Public/Granted literature
- US20150325526A1 IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD USING THE SAME Public/Granted day:2015-11-12
Information query
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