Invention Grant
- Patent Title: Automatic defect analyzer for nanoimprint lithography using image analysis
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Application No.: US16227614Application Date: 2018-12-20
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Publication No.: US10901327B2Publication Date: 2021-01-26
- Inventor: Kathryn Brenda Bean , Teresa Perez Estrada
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Main IPC: B82Y10/00
- IPC: B82Y10/00 ; G03F7/20 ; G03F7/00 ; B82Y40/00

Abstract:
A plurality of images of a plurality of fields is acquired using an image sensor under varying conditions associated with a defect. Defect pixels in a test image in the plurality of images are identified using a standard image to provide a defect tolerance level. The standard image has no defects. Clustering analysis is performed on the identified defect pixels based on the defect tolerance level to obtain defect clusters. A process window is generated based on the defect clusters. An imprint process is created according to the process window.
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