Invention Grant
- Patent Title: EUV cleaning systems and methods thereof for an extreme ultraviolet light source
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Application No.: US16575068Application Date: 2019-09-18
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Publication No.: US10901329B2Publication Date: 2021-01-26
- Inventor: Marc Guy Langlois
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; H05G2/00
Abstract:
Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.
Public/Granted literature
- US20200012202A1 EUV CLEANING SYSTEMS AND METHODS THEREOF FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2020-01-09
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