Invention Grant
- Patent Title: Conductive structure and wiring structure including the same
-
Application No.: US16399907Application Date: 2019-04-30
-
Publication No.: US10903169B2Publication Date: 2021-01-26
- Inventor: Wen Hung Huang
- Applicant: Advanced Semiconductor Engineering, Inc.
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Agency: Foley & Lardner LLP
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/31 ; H01L21/48 ; H01L21/52 ; H01L21/56

Abstract:
A conductive structure includes a core portion, a plurality of electronic devices and a filling material. The core portion defines a cavity. The electronic devices are disposed in the cavity of the core portion. The filling material is disposed between the electronic devices and a sidewall of the cavity of the core portion.
Public/Granted literature
- US20200350254A1 CONDUCTIVE STRUCTURE AND WIRING STRUCTURE INCLUDING THE SAME Public/Granted day:2020-11-05
Information query
IPC分类: