Invention Grant
- Patent Title: Gas-containing base material and manufacturing method therefor
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Application No.: US16149449Application Date: 2018-10-02
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Publication No.: US10905635B2Publication Date: 2021-02-02
- Inventor: Tooru Takeda , Hirokazu Toyoshima , Takeshi Sawai , Kazumi Inoue
- Applicant: Shinryo Corporation
- Applicant Address: JP Kyushu
- Assignee: Shinryo Corporation
- Current Assignee: Shinryo Corporation
- Current Assignee Address: JP Kyushu
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-081449 20160414,JP2017-003163 20170112
- Main IPC: A61K8/02
- IPC: A61K8/02 ; B01F5/16 ; B01F5/06 ; A23L33/10 ; A61K9/00 ; A61K47/42 ; A61K47/02 ; A61K47/36 ; A61K8/19 ; A61K8/73 ; A61K8/65 ; B01J13/00 ; A23P30/40 ; A61Q19/00
Abstract:
A gas-containing base material including a functional-gas-containing composition, where the composition is a gel-like composition having a gelation temperature in a range of 0.5° C. or higher and 65° C. or lower at which a liquid form is able to be changed to a solid form by cooling, and where the composition contains an amount of a bubble state functional gas which exceeds a saturated solubility when the composition is in a liquid form.
Public/Granted literature
- US20190029927A1 GAS-CONTAINING BASE MATERIAL AND MANUFACTURING METHOD THEREFOR Public/Granted day:2019-01-31
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