Invention Grant
- Patent Title: Antimicrobial composition including a residual barrier film
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Application No.: US13688078Application Date: 2012-11-28
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Publication No.: US10905869B2Publication Date: 2021-02-02
- Inventor: Patrick O. Tennican
- Applicant: Hyprotek, Inc.
- Applicant Address: US WA Spokane
- Assignee: Hyprotek, Inc.
- Current Assignee: Hyprotek, Inc.
- Current Assignee Address: US WA Spokane
- Agency: Lee & Hayes, P.C.
- Main IPC: A01N59/00
- IPC: A01N59/00 ; A61M39/16 ; A61K33/40 ; A61M11/08 ; A61M15/08 ; A61M39/20 ; A61M25/00 ; A61K9/00 ; A61K47/18 ; A61M35/00

Abstract:
This disclosure describes example antimicrobial compositions that may be used in combination with IV port cleansing caps, protective caps, or nasal decolonizer devices. According to another implementations, the disclosure describes that the antimicrobial composition may provide an indication that it has come into contact with a contaminant by bubbling or foam on a surface that is being cleaned. According to another implementation, the disclosure describes that the antimicrobial composition may leave a residual film or barrier to inhibit the recontamination of a surface that has been cleaned.
Public/Granted literature
- US20130136801A1 Antimicrobial Composition Including a Residual Barrier Film Public/Granted day:2013-05-30
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