Invention Grant
- Patent Title: Liquid jetting apparatus and method of producing liquid jetting apparatus
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Application No.: US16798726Application Date: 2020-02-24
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Publication No.: US10906308B2Publication Date: 2021-02-02
- Inventor: Taiki Tanaka , Keita Hirai
- Applicant: BROTHER KOGYO KABUSHIKI KAISHA
- Applicant Address: JP Nagoya
- Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee Address: JP Nagoya
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Priority: JP2016-015191 20160129
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16

Abstract:
There is provided a liquid jetting apparatus, including: a first pressure chamber and a second pressure chamber arranged in a first direction; a first insulating film covering the first and second pressure chambers; a first piezoelectric element arranged to face the first pressure chamber with the first insulating film being intervened therebetween; a second piezoelectric element arranged to face the second pressure chamber with the first insulating film being intervened therebetween; a trace arranged between the first and the second piezoelectric elements adjacent to each other in the first direction; and a second insulating film covering the trace. An end, in the first direction, of a part of the second insulating film covering the trace between the first piezoelectric element and the second piezoelectric element is positioned inside an end of a partition wall partitioning the first pressure chamber and the second pressure chamber.
Information query
IPC分类: