Invention Grant
- Patent Title: Substrate processing device
-
Application No.: US16252978Application Date: 2019-01-21
-
Publication No.: US10906756B2Publication Date: 2021-02-02
- Inventor: Shinji Wakabayashi , Keisuke Kondoh
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2016-144764 20160722
- Main IPC: B65G49/07
- IPC: B65G49/07 ; H01L21/67 ; H01L21/677

Abstract:
Four groups of a three-tier arrangement of processing units, each of the processing units being provided with two processing modules and a load lock module, are provided in the front and rear sides along a Y-guide extending rearward when viewed from an EFEM and in the left and right sides of the Y-guide. An exchange of a substrate between a delivery mechanism on the EFEM side and a substrate transfer mechanism on the processing unit side is performed by a substrate loading part, which is movable along the Y-guide and can move upward and downward, and on which a plurality of wafers can be placed in a shelf-like manner.
Public/Granted literature
- US20190152722A1 SUBSTRATE PROCESSING DEVICE Public/Granted day:2019-05-23
Information query
IPC分类: