Invention Grant
- Patent Title: Apparatus and method for processing sputtered IC units
-
Application No.: US15503694Application Date: 2015-08-12
-
Publication No.: US10907247B2Publication Date: 2021-02-02
- Inventor: Chong Chen Gary Lim , Seung Ho Baek , Jong Jae Jung , Yun Suk Shin , Deok Chun Jang
- Applicant: ROKKO SYSTEMS PTE LTD
- Applicant Address: SG Singapore
- Assignee: ROKKO SYSTEMS PTE LTD
- Current Assignee: ROKKO SYSTEMS PTE LTD
- Current Assignee Address: SG Singapore
- Priority: SG10201404879U 20140813
- International Application: PCT/SG2015/050257 WO 20150812
- International Announcement: WO2016/024917 WO 20160218
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/50 ; H01L21/67 ; H01L21/683

Abstract:
A method for preparing a film carrier for sputtering of IC units placed thereon, the method comprising the steps of: providing a carrier of IC units; removing said units from the carrier; delivering said IC units to a flipper; inverting and delivering said units to a sputtering film frame; placing the units on said sputtering film frame in an array having a pre-determined clearance about adjacent units.
Public/Granted literature
- US20170260623A1 APPARATUS AND METHOD FOR PROCESSING SPUTTERED IC UNITS Public/Granted day:2017-09-14
Information query
IPC分类: