• Patent Title: Method for pulling a single crystal by the FZ method comprising dynamically adapting the power of a melting apparatus based on a position of lower and upper phase boundaries
  • Application No.: US16473388
    Application Date: 2018-01-31
  • Publication No.: US10907271B2
    Publication Date: 2021-02-02
  • Inventor: Thomas Schroeck
  • Applicant: SILTRONIC AG
  • Applicant Address: DE Munich
  • Assignee: SILTRONIC AG
  • Current Assignee: SILTRONIC AG
  • Current Assignee Address: DE Munich
  • Agency: Brooks Kushman P.C.
  • Priority: DE102017202311 20170214
  • International Application: PCT/EP2018/052352 WO 20180131
  • International Announcement: WO2018/149640 WO 20180823
  • Main IPC: C30B13/20
  • IPC: C30B13/20 C30B15/36 C30B13/30 C30B29/06
Method for pulling a single crystal by the FZ method comprising dynamically adapting the power of a melting apparatus based on a position of lower and upper phase boundaries
Abstract:
A single crystal is pulled by the FZ method, in which in a first phase, a lower end of the polycrystal is melted by the melting apparatus, in a second phase, a monocrystalline seed is attached to the lower end of the polycrystal, and in a third phase, between a lower section of the seed and the polycrystal, a thin neck section is formed whose diameter is smaller than that of the seed, where the power of the melting apparatus before the third phase is dynamically adapted in dependence on a position of a lower phase boundary (PU) between liquid material and solid material on the part of the seed, and where the power of the melting apparatus during the third phase is dynamically adapted in dependence on the position of an upper phase boundary (PO) between liquid material and solid material on the part of the polycrystal plant.
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