Invention Grant
- Patent Title: Optical measurement device and method with improved measurement precision
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Application No.: US16338636Application Date: 2017-09-25
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Publication No.: US10907952B2Publication Date: 2021-02-02
- Inventor: Yuzhi Li , Bing Xu , Zhiyong Yang , Chang Zhou
- Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Applicant Address: CN Shanghai
- Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Current Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Current Assignee Address: CN Shanghai
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: CN201610876766 20160930
- International Application: PCT/CN2017/103232 WO 20170925
- International Announcement: WO2018/059358 WO 20180405
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F7/20 ; G01N21/956 ; H01L21/68

Abstract:
An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module (5) and a substrate carrier (6) which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module (5) and the substrate carrier (6) and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate (9).
Public/Granted literature
- US20190226831A1 OPTICAL MEASUREMENT DEVICE AND METHOD Public/Granted day:2019-07-25
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