Invention Grant
- Patent Title: Membrane device, measurement device, and method for producing membrane device
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Application No.: US16082431Application Date: 2016-04-28
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Publication No.: US10908121B2Publication Date: 2021-02-02
- Inventor: Itaru Yanagi
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2016/063320 WO 20160428
- International Announcement: WO2017/187588 WO 20171102
- Main IPC: G01N27/447
- IPC: G01N27/447 ; G01N21/64 ; G01N33/487 ; H01L21/02
Abstract:
The present invention provides a membrane device having a configuration capable of reducing the frequency of clogging of a sample in a nanopore when the sample passes through the nanopore. In the membrane device according to the present invention, a membrane and a semiconductor layer are stacked on a Si substrate, and an insulating film is formed on a side wall of a through hole included in the semiconductor layer.
Public/Granted literature
- US20190094180A1 Membrane Device, Measurement Device, and Method for Producing Membrane Device Public/Granted day:2019-03-28
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