Invention Grant
- Patent Title: Rate enhanced pulsed DC sputtering system
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Application No.: US15802791Application Date: 2017-11-03
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Publication No.: US10910203B2Publication Date: 2021-02-02
- Inventor: Douglas Pelleymounter
- Applicant: Advanced Energy Industries, Inc.
- Applicant Address: US CO Fort Collins
- Assignee: Advanced Energy Industries, Inc.
- Current Assignee: Advanced Energy Industries, Inc.
- Current Assignee Address: US CO Fort Collins
- Agency: Neugeboren O'Dowd PC
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35 ; C23C14/34

Abstract:
A sputtering system and method are disclosed. The system includes first power source coupled to a first magnetron and an anode, and the first power source provides a first anode voltage that alternates between positive and negative during each of multiple cycles. The system also includes a second power source coupled to the second magnetron and the anode, and the second power source provides a second anode voltage that alternates between positive and negative during each of the multiple cycles. A controller of the system controls the first power source and the second power source to phase-synchronize the first anode voltage with the second anode voltage, so both, the first anode voltage and the second anode voltage, are simultaneously negative during a portion of each cycle and simultaneously positive relative to the first and second magnetrons during another portion of each cycle.
Public/Granted literature
- US20180130648A1 Rate Enhanced Pulsed DC Sputtering System Public/Granted day:2018-05-10
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