Invention Grant
- Patent Title: Substrate processing device
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Application No.: US16081303Application Date: 2017-02-27
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Publication No.: US10910240B2Publication Date: 2021-02-02
- Inventor: Ryo Muramoto
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JP2016-048714 20160311
- International Application: PCT/JP2017/007486 WO 20170227
- International Announcement: WO2017/154639 WO 20170914
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677

Abstract:
A first transfer robot carries a substrate into and out of a container. A second transfer robot receives and delivers the substrate from and to the first transfer robot, and carries the substrate into and out of a first processing portion through a first exit/entrance port. A third transfer robot receives and delivers the substrate from and to the second transfer robot, carries the substrate into and out of a second processing portion through a second exit/entrance port, and carries the substrate into and out of a third processing portion through a third exit/entrance port.
Public/Granted literature
- US20190013220A1 SUBSTRATE PROCESSING DEVICE Public/Granted day:2019-01-10
Information query
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