Invention Grant
- Patent Title: Pin control method and substrate processing apparatus
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Application No.: US16427874Application Date: 2019-05-31
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Publication No.: US10910251B2Publication Date: 2021-02-02
- Inventor: Shin Matsuura , Masato Horiguchi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2017-080697 20170414
- Main IPC: H01L21/68
- IPC: H01L21/68 ; H01L21/687 ; H01L21/67 ; H01L21/677 ; H01L21/3065

Abstract:
A substrate processing apparatus includes a processing container; a placement table; a plurality of pins provided on the placement table configured to perform delivery of the substrate; a plurality of drivers configured to vertically drive the plurality of pins, respectively; a plurality of measuring devices each including an encoder configured to measure height positions of the plurality of pins, respectively. The substrate processing apparatus also includes a controller configured to: measure the height positions of the plurality of pins; select a reference pin; estimate a reference height position; calculate an adjustment speed for making the height positions of the pins other than the reference pin match with the estimated reference height position; and control the drivers, which drive the other pins, to adjust driving speeds of the other pins to an adjustment speed.
Public/Granted literature
- US20190287844A1 PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2019-09-19
Information query
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