In a general aspect, a method can include forming a first conductive metal layer including a common gate conductor, and coupling a plurality of semiconductor die to the common gate conductor of the first conductive metal layer where the plurality of semiconductor die include a first silicon carbide die and a second silicon carbide die. The method can include encapsulating at least a portion of the first conductive metal layer and the semiconductor die within an insulator where the first conductive metal layer includes a first conductive path between the common gate conductor and a die gate conductor of the first silicon carbide die, and a second conductive path between the common gate conductor and a die gate conductor of the second silicon carbide die. The first conductive path can have a length substantially equal to a length of the second conductive path.