Invention Grant
- Patent Title: Photoresist composition and process for producing photoresist pattern
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Application No.: US16012993Application Date: 2018-06-20
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Publication No.: US10915022B2Publication Date: 2021-02-09
- Inventor: Katsuhiro Komuro , Shingo Fujita , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2017-123230 20170623
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/004 ; G03F7/039 ; G03F7/30 ; G03F7/20 ; G03F7/38 ; G03F7/16
Abstract:
A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
Public/Granted literature
- US20180373149A1 PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2018-12-27
Information query
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