Invention Grant
- Patent Title: Ferroelectric memory device containing a series connected select gate transistor and method of forming the same
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Application No.: US16454458Application Date: 2019-06-27
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Publication No.: US10916287B2Publication Date: 2021-02-09
- Inventor: Yanli Zhang , Johann Alsmeier
- Applicant: SANDISK TECHNOLOGIES LLC
- Applicant Address: US TX Addison
- Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee Address: US TX Addison
- Agency: The Marbury Law Group, PLLC
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L27/1159 ; H01L27/11587 ; H01L27/11592 ; H01L27/11597 ; H01L27/11585

Abstract:
A ferroelectric memory unit cell includes a series connection of select gate transistor that turns the ferroelectric memory unit cell on and off, and a ferroelectric memory transistor. Data is stored in a ferroelectric material layer of the ferroelectric memory transistor. The ferroelectric memory unit cell may be a planar structure in which both transistors are planar transistors with horizontal current directions. In this case, the gate electrode of the access transistor can be formed as a buried conductive line. Alternatively, the ferroelectric memory unit cell may include a vertical stack of vertical semiconductor channels.
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