Invention Grant
- Patent Title: Surface treatment composition, method of producing surface treatment composition, method of treating surface, and method of producing semiconductor substrate
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Application No.: US16084196Application Date: 2017-03-06
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Publication No.: US10916435B2Publication Date: 2021-02-09
- Inventor: Yasuto Ishida
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Aichi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Aichi
- Agency: Katten Munchin Rosenman LLP
- Priority: JP2016-067151 20160330
- International Application: PCT/JP2017/008837 WO 20170306
- International Announcement: WO2017/169539 WO 20171005
- Main IPC: H01L21/304
- IPC: H01L21/304 ; C09G1/02 ; C11D1/04 ; C11D1/12 ; C11D7/34 ; C11D11/00 ; H01L21/02
Abstract:
The present invention provides a means for sufficiently removing organic residues remaining on the surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished. The present invention relates to a surface treatment composition including a polymer compound having a sulfonic acid (salt) group and water, wherein the surface treatment composition has a pH value of less than 7 and the surface treatment composition is used for decreasing an organic residue on a surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished.
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