Invention Grant
- Patent Title: Semiconductor device and method for manufacturing semiconductor device
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Application No.: US16078494Application Date: 2017-03-14
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Publication No.: US10916447B2Publication Date: 2021-02-09
- Inventor: Yasushi Fujioka , Takeo Furuhata , Tomohiro Shinagawa , Keisuke Nakamura
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Chiyoda-ku
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-ku
- Agency: Xsensus LLP
- Priority: JP2016-054669 20160318
- International Application: PCT/JP2017/010202 WO 20170314
- International Announcement: WO2017/159682 WO 20170921
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/66 ; H01L29/778 ; H01L21/48 ; H01L23/373 ; C23C16/02 ; C23C16/27 ; H01L21/268 ; H01L29/06

Abstract:
In a semiconductor device including a crystalline nitride layer, in which diamond is used for heat dissipation thereof, it is an object of the present invention to suppress cracking of the crystalline nitride layer. The semiconductor device includes a layered body and a heat dissipation layer. The layered body includes a crystalline nitride layer and a composite layer. The composite layer includes a non-inhibiting portion which does not inhibit diamond growth on a surface thereof and an inhibiting portion which inhibits the diamond growth on the surface. A layered body main surface of the layered body has a first region in which the non-inhibiting portion is exposed and a second region in which the inhibiting portion is exposed. The heat dissipation layer is made of diamond, opposed to the main surface, adhered to the first region, and separated from the second region with a void interposed therebetween.
Public/Granted literature
- US20190051538A1 SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Public/Granted day:2019-02-14
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