Invention Grant
- Patent Title: Wafer producing apparatus
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Application No.: US16020414Application Date: 2018-06-27
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Publication No.: US10916460B2Publication Date: 2021-02-09
- Inventor: Kentaro Iizuka , Naoki Omiya , Takashi Mori , Motomi Kitano , Kazuya Hirata , Hiroshi Kitamura
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Bums & Crain Ltd.
- Priority: JP2017-128507 20170630
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B24B7/22 ; H01L21/677 ; B23K26/00 ; H01L29/16 ; H01L21/02

Abstract:
A wafer producing apparatus for producing an SiC wafer from a single-crystal SiC ingot includes an ingot grinding unit, a laser applying unit that applies a pulsed laser beam having a wavelength that is transmittable through the single-crystal SiC ingot while positioning a focal point of the pulsed laser beam in the single-crystal SiC ingot at a depth corresponding to the thickness of the SiC wafer to be produced from an upper surface of the single-crystal SiC ingot, thereby forming a peel-off layer in the single-crystal SiC ingot, a wafer peeling unit that peels the SiC wafer off the peel-off layer in the single-crystal SiC ingot, and a delivery unit assembly that delivers the single-crystal SiC ingot between the ingot grinding unit, the laser applying unit, and the wafer peeling unit.
Public/Granted literature
- US20190006212A1 WAFER PRODUCING APPARATUS Public/Granted day:2019-01-03
Information query
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