Invention Grant
- Patent Title: Stacked FinFET mask-programmable read only memory containing spaced apart upper and lower threshold voltage setting layers
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Application No.: US16172227Application Date: 2018-10-26
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Publication No.: US10916552B2Publication Date: 2021-02-09
- Inventor: Alexander Reznicek , Karthik Balakrishnan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/112 ; H01L27/088

Abstract:
A stacked FinFET mask-programmable read only memory (ROM) is provided. The stacked FinFET mask-programmable ROM includes a fin structure extending upward from an insulator layer. The fin structure includes, from bottom to top, a first semiconductor fin portion, an insulator fin portion, and a second semiconductor fin portion. A lower gate structure having a first threshold voltage contacts a sidewall of the first semiconductor fin portion, and an upper gate structure having a second threshold voltage contacts a sidewall of the second semiconductor fin portion.
Information query
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