Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16241106Application Date: 2019-01-07
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Publication No.: US10916644B2Publication Date: 2021-02-09
- Inventor: Keiko Kawamura , Tsuneo Ogura
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: White & Case LLP
- Priority: JP2018-172650 20180914
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/10 ; H01L29/868 ; H01L29/417

Abstract:
A semiconductor device includes a first electrode, a second electrode disposed at a position opposing the first electrode, and a semiconductor body provided between the first electrode and the second electrode. The semiconductor body includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a third semiconductor layer of the second conductivity type; the second semiconductor layer is provided between the first semiconductor layer and the first electrode; and the third semiconductor layer is selectively provided inside the first semiconductor layer and disposed at a position separated from the second semiconductor layer. The first electrode is electrically connected to the second semiconductor layer and includes an extension portion; and the extension portion pierces the second semiconductor layer, extends in a first direction toward the second electrode, and is connected to the third semiconductor layer.
Public/Granted literature
- US20200091324A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-03-19
Information query
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