Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16541026Application Date: 2019-08-14
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Publication No.: US10916666B2Publication Date: 2021-02-09
- Inventor: Koji Okuno
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2018-198246 20181022
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/78 ; H01L29/16

Abstract:
Provided is a semiconductor device including: a semiconductor layer of a first conductivity type provided on the semiconductor substrate; a first main electrode provided on the semiconductor layer; a second main electrode provided on a main surface of the semiconductor substrate, opposite to a side on which the first main electrode is provided; an electric field limiting region of a second conductivity type provided in an outside terminal end region on an outer peripheral side of the semiconductor device, a first protective film covering at least the electric field limiting region; a protective metal film provided on a portion from an outside end edge portion of the first protective film to a front surface of the semiconductor layer; and a second protective film provided covering portions on an end edge portion of the first main electrode, the first protective film, and the protective metal film.
Information query
IPC分类: