Invention Grant
- Patent Title: Low resistance contact for transistors
-
Application No.: US16546351Application Date: 2019-08-21
-
Publication No.: US10923575B2Publication Date: 2021-02-16
- Inventor: Lawrence A. Clevenger , Junli Wang , Kirk D. Peterson , Baozhen Li , Terry A. Spooner , John E. Sheets, II
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Douglas Pearson
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/45 ; H01L29/66 ; H01L21/768 ; H01L29/78

Abstract:
According to an embodiment of the present invention, a method for forming contacts includes forming an oxide layer over and along a first liner layer. A first spacer layer is formed along the first liner layer opposing the oxide layer. A work function metal layer is formed along the first spacer layer opposing the first liner layer. A gate is formed on and along the work function metal opposing the first spacer. A second spacer layer is formed on the oxide layer. Portions of the oxide layer, the first liner layer, the first spacer, the work function metal layer and the second spacer layer are removed which forms a recess between the gate and the first spacer layer. A second liner layer is deposited in the recess. A low-resistance metal is deposited in the removed portions to form the first contact.
Public/Granted literature
- US20200013868A1 LOW RESISTANCE CONTACT FOR TRANSISTORS Public/Granted day:2020-01-09
Information query
IPC分类: