Invention Grant
- Patent Title: Method for producing transparent optical film and method for producing transparent multilayer film
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Application No.: US16568905Application Date: 2019-09-12
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Publication No.: US10927446B2Publication Date: 2021-02-23
- Inventor: Seigo Nakamura , Kenichi Umeda , Yuichiro Itai , Shinichiro Sonoda
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2017-052970 20170317
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/08 ; C23C14/18 ; G02B1/115

Abstract:
This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.
Public/Granted literature
- US20200002804A1 METHOD FOR PRODUCING TRANSPARENT OPTICAL FILM AND METHOD FOR PRODUCING TRANSPARENT MULTILAYER FILM Public/Granted day:2020-01-02
Information query
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