Invention Grant
- Patent Title: Method of forming a micro-structure
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Application No.: US16212435Application Date: 2018-12-06
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Publication No.: US10927472B2Publication Date: 2021-02-23
- Inventor: Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agency: Dierker & Kavanaugh PC
- Main IPC: C25D11/04
- IPC: C25D11/04 ; B81C1/00 ; C25D11/26 ; C25D11/02 ; C25D11/08 ; C25D11/10 ; C25D11/12 ; C25D11/16 ; C25D11/24

Abstract:
A method of forming a micro-structure involves forming a multi-layered structure including i) an oxidizable material layer on a substrate and ii) another oxidizable material layer on the oxidizable material layer. The oxidizable material layer is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template, including a plurality of pores, from the other oxidizable material layer, and growing a nano-pillar inside each pore. The nano-pillar has a predefined length that terminates at an end. A portion of the template is selectively removed to form a substantially even plane that is oriented in a position opposed to the substrate. A material is deposited on at least a portion of the plane to form a film layer thereon, and the remaining portion of the template is selectively removed to expose the nano-pillars.
Public/Granted literature
- US20190106802A1 METHOD OF FORMING A MICRO-STRUCTURE Public/Granted day:2019-04-11
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