- Patent Title: System, method, and apparatus for aftertreatment system monitoring
-
Application No.: US16266593Application Date: 2019-02-04
-
Publication No.: US10927741B2Publication Date: 2021-02-23
- Inventor: Xi Wei , David Samuel Everard , Baohua Qi , Mickey R. McDaniel , Edmund P. Hodzen , Guoqiang Li
- Applicant: Cummins Emissions Solutions Inc.
- Applicant Address: US IN Columbus
- Assignee: Cummins Emissions Solutions Inc.
- Current Assignee: Cummins Emissions Solutions Inc.
- Current Assignee Address: US IN Columbus
- Agency: Taft Stettinius & Hollister LLP
- Main IPC: F01N3/10
- IPC: F01N3/10 ; F01N3/20 ; F01N11/00

Abstract:
A method includes determining whether a urea refill event is detected, and clearing a quality accumulator value and clearing a latching abort command. The method includes determining whether urea fluid quality check abort conditions are met, and clearing the urea quality accumulator, latching the abort command, and exiting the reductant fluid quality check. In response to the abort conditions not being met, incrementing the urea quality accumulator according to an amount of urea being injected, and comparing the accumulated urea quantity to a low test threshold. The method includes, in response to the accumulated urea quantity being greater than the low test threshold, comparing the accumulated urea quantity to a high test threshold, and in response to the urea quantity being greater than the high test threshold, determining whether the a NOx exceedance is observed and clearing a urea quality error in response to the NOx exceedance not being observed.
Public/Granted literature
- US20190178133A1 SYSTEM, METHOD, AND APPARATUS FOR AFTERTREATMENT SYSTEM MONITORING Public/Granted day:2019-06-13
Information query
IPC分类: