Invention Grant
- Patent Title: Gamma automatic adjusting method and gamma automatic adjusting method system
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Application No.: US15775933Application Date: 2018-03-12
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Publication No.: US10928683B2Publication Date: 2021-02-23
- Inventor: Zhengxing Xu
- Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Guangdong
- Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee Address: CN Guangdong
- Priority: CN201810136133.X 20180209
- International Application: PCT/CN2018/078692 WO 20180312
- International Announcement: WO2019/153410 WO 20190815
- Main IPC: G02F1/1337
- IPC: G02F1/1337 ; G02F1/13 ; G09G3/20

Abstract:
A gamma automatic adjusting method and a gamma automatic adjusting system are provided. The method includes steps as follows: acquiring parameters of main affecting factors a gamma value in a liquid crystal panel light alignment; using a gamma model upon detecting a varied parameter of the main affecting factor; calculating and outputting an adjusting parameter of the main affecting factor by the gamma model to a UV irradiating machine; and irradiating the liquid crystal panel by the UV irradiating machine according to the adjusting parameter to keep the gamma value within a predetermined range.
Public/Granted literature
- US20200301212A1 GAMMA AUTOMATIC ADJUSTING METHOD AND GAMMA AUTOMATIC ADJUSTING METHOD SYSTEM Public/Granted day:2020-09-24
Information query
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