- Patent Title: Photosensitive resin composition, and polymer film made therefrom
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Application No.: US16027327Application Date: 2018-07-04
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Publication No.: US10928730B2Publication Date: 2021-02-23
- Inventor: Chen-Feng Yen , Shou-Jui Hsiang , Pei-Jung Wu , Szu-Hsiang Su
- Applicant: Zhen Ding Technology Co., Ltd.
- Applicant Address: TW Taoyuan
- Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee Address: TW Taoyuan
- Agency: ScienBiziP, P.C.
- Priority: CN201810495434.1 20180522
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/32 ; C08G18/67 ; C08F2/50 ; C08F299/06 ; G03F7/037

Abstract:
A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the R1 group, and diamine monomers each having the R2 group. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having R1 group is a soft long-chain diamine monomer. R2 group comprises at least one secondary amine group or tertiary amine group.
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