Invention Grant
- Patent Title: Display device and manufacturing method thereof
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Application No.: US16368841Application Date: 2019-03-28
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Publication No.: US10930720B2Publication Date: 2021-02-23
- Inventor: Miyuki Ishikawa , Masashi Tsubuku
- Applicant: Japan Display Inc.
- Applicant Address: JP Tokyo
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- Priority: JPJP2018-072325 20180404
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L27/12 ; H01L29/786 ; H01L29/51 ; H01L21/02 ; H01L29/66 ; H01L29/49 ; G02F1/1362 ; G02F1/1368
Abstract:
One embodiment of the invention is characterized as follows. A display device comprising: a display area including a plurality of pixels, each of the pixels has a first TFT and a second TFT, the first TFT and the second TFT comprise an oxide semiconductor, the first TFT and the second TFT are covered by an interlayer insulating film, a first through hole is formed in the in the interlayer insulating film to connect a drain of the first TFT, wherein a distance d1 between a center of the first through hole and an edge of a channel of the first TFT is shorter than a distance d2 between a center of the first through hole and an edge of a channel of the second TFT, a channel length of the first TFT is shorter than a channel length of the second TFT.
Public/Granted literature
- US20190312062A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-10-10
Information query
IPC分类:
