Invention Grant
- Patent Title: Edge-emitting semiconductor laser and method for operating a semiconductor laser
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Application No.: US16217439Application Date: 2018-12-12
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Publication No.: US10931084B2Publication Date: 2021-02-23
- Inventor: Alexander Bachmann
- Applicant: OSRAM Opto Semiconductors GmbH
- Applicant Address: DE Regensburg
- Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee Address: DE Regensburg
- Agency: Slater Matsil, LLP
- Priority: DE102016111255.0 20160620
- Main IPC: H01S5/34
- IPC: H01S5/34 ; H01S5/30 ; H01S5/20 ; H01S5/32 ; H01S5/10

Abstract:
An edge-emitting semiconductor laser and a method for operating a semiconductor laser are disclosed. The edge-emitting semiconductor laser includes an active zone within a semiconductor layer sequence and a stress layer. The active zone is configured for being energized only in a longitudinal strip perpendicular to a growth direction of the semiconductor layer sequence. The semiconductor layer sequence has a constant thickness throughout in the region of the longitudinal strip so that the semiconductor laser is gain-guided. The stress layer may locally stress the semiconductor layer sequence in a direction perpendicular to the longitudinal strip and in a direction perpendicular to the growth direction. A refractive index of the semiconductor layer sequence, in regions which, seen in plan view, are located next to the longitudinal strip, for the laser radiation generated during operation is reduced by at least 2×10−4 and by at most 5×10−3.
Public/Granted literature
- US20190131773A1 Edge-emitting Semiconductor Laser and Method for Operating a Semiconductor Laser Public/Granted day:2019-05-02
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