Invention Grant
- Patent Title: Reflection and diffraction control with slanted semiconductor metamaterials
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Application No.: US15943172Application Date: 2018-04-02
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Publication No.: US10935702B2Publication Date: 2021-03-02
- Inventor: Scott R. Sorbel , Katherine T. Fountaine
- Applicant: NORTHROP GRUMMAN SYSTEMS CORPORATION
- Applicant Address: US VA Falls Church
- Assignee: NORTHROP GRUMMAN SYSTEMS CORPORATION
- Current Assignee: NORTHROP GRUMMAN SYSTEMS CORPORATION
- Current Assignee Address: US VA Falls Church
- Agency: Shumaker, Loop & Kendrick, LLP
- Agent John A. Miller
- Main IPC: G02B5/00
- IPC: G02B5/00 ; H01L31/0352 ; H01L29/06 ; G02B1/111

Abstract:
An absorption element for absorbing radiation incident on the element at a certain wavelength band. The element includes a surface defining a normal direction perpendicular to the surface. The element also includes an array of a plurality of spaced apart nano-pillars extending from the surface at an angle orientation other than the normal direction, which creates angular asymmetry so as to increase the element's absorption response in a particular direction. The nano-pillars are made of a suitable semiconductor material and have a size relative to the wavelength band to absorb the radiation. In one non-limiting embodiment, the nano-pillars are angled at 45° relative to the normal direction and are cone-shaped to broaden their absorption capabilities.
Public/Granted literature
- US20190302325A1 REFLECTION AND DIFFRACTION CONTROL WITH SLANTED SEMICONDUCTOR METAMATERIALS Public/Granted day:2019-10-03
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