Invention Grant
- Patent Title: Nanoimprint template with light blocking material and method of fabrication
-
Application No.: US15720308Application Date: 2017-09-29
-
Publication No.: US10935883B2Publication Date: 2021-03-02
- Inventor: Amir Tavakkoli Kermani Ghariehali , Edward Brian Fletcher
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agent Cameron A. King
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C39/04 ; B29C39/26 ; B29C33/38 ; H01L21/027 ; B29L31/34

Abstract:
A nanoimprint lithography template, method of fabrication, and method of manufacturing an article using the same. The template includes a body having first and second opposed sides, the second side having a mesa extending therefrom, with the mesa having sidewalls and a surface. A recessed shelf extends around a perimeter of the mesa surface, with a light-blocking material positioned on at least the recessed shelf and at a thickness such that the light-blocking material does not extend beyond a plane defined by the mesa surface.
Public/Granted literature
- US20190101822A1 NANOIMPRINT TEMPLATE WITH LIGHT BLOCKING MATERIAL AND METHOD OF FABRICATION Public/Granted day:2019-04-04
Information query