Invention Grant
- Patent Title: Lithographic apparatus
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Application No.: US16539487Application Date: 2019-08-13
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Publication No.: US10935895B2Publication Date: 2021-03-02
- Inventor: Adrianus Hendrik Koevoets , Erik Johan Arlemark , Sander Catharina Reinier Derks , Sjoerd Nicolaas Lambertus Donders , Wilfred Edward Endendijk , Franciscus Johannes Joseph Janssen , Raymond Wilhelmus Louis Lafarre , Leon Martin Levasier , Jim Vincent Overkamp , Nicolaas Ten Kate , Jacobus Cornelis Gerardus Van Der Sanden
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15164362 20150421,EP15169023 20150522,EP15192297 20151030,EP15201030 20151218
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; H01L21/67 ; H01L21/683
Abstract:
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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