Invention Grant
- Patent Title: LED wafer processing method
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Application No.: US16512539Application Date: 2019-07-16
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Publication No.: US10937658B2Publication Date: 2021-03-02
- Inventor: Makiko Ohmae
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JPJP2018-137058 20180720
- Main IPC: H01L21/304
- IPC: H01L21/304 ; B23K26/38 ; B23K26/364 ; B23K26/40 ; B28D5/00 ; H01L21/67 ; B23K101/40 ; B23K103/00

Abstract:
An LED wafer is formed from a sapphire substrate having a front side. A plurality of crossing division lines are formed on the front side of the sapphire substrate to thereby define a plurality of separate regions where a plurality of LEDs are respectively formed. An LED wafer processing method includes preparing a V-blade having an annular cutting edge whose outer circumferential portion has a V-shaped cross section, rotatably mounting the V-blade in a cutting unit, holding the LED wafer on a holding table with the back side of the LED wafer exposed upward, and then relatively moving the cutting unit and the holding table to form a chamfered portion on the back side of the LED wafer along an area corresponding to each division line formed on the front side of the LED wafer.
Public/Granted literature
- US20200027739A1 LED WAFER PROCESSING METHOD Public/Granted day:2020-01-23
Information query
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